// // ******************************************************************** // * License and Disclaimer * // * * // * The Geant4 software is copyright of the Copyright Holders of * // * the Geant4 Collaboration. It is provided under the terms and * // * conditions of the Geant4 Software License, included in the file * // * LICENSE and available at http://cern.ch/geant4/license . These * // * include a list of copyright holders. * // * * // * Neither the authors of this software system, nor their employing * // * institutes,nor the agencies providing financial support for this * // * work make any representation or warranty, express or implied, * // * regarding this software system or assume any liability for its * // * use. Please see the license in the file LICENSE and URL above * // * for the full disclaimer and the limitation of liability. * // * * // * This code implementation is the result of the scientific and * // * technical work of the GEANT4 collaboration. * // * By using, copying, modifying or distributing the software (or * // * any work based on the software) you agree to acknowledge its * // * use in resulting scientific publications, and indicate your * // * acceptance of all terms of the Geant4 Software license. * // ******************************************************************** // // $Id: G4ElectronCapture.hh,v 1.1 2010-08-31 11:23:58 vnivanch Exp $ // GEANT4 tag $Name: not supported by cvs2svn $ // //--------------------------------------------------------------------------- // // ClassName: G4MicroElecCapture // // Description: The process to kill e- to save CPU // // Author: V.Ivanchenko 31 August 2010 modified and adapted to MicorElec by C. Inguimbert 321/01/2022 // //---------------------------------------------------------------------------- // // Class description: // // G4ElectronCapture allows to remove unwanted e- from simulation in // order to improve CPU performance. There are two parameters: // // 1) low energy threshold for e- kinetic energy (default 0) // 2) the name of G4Region where process is active // // // If an electron track is killed then energy deposition is added to the step // //....oooOO0OOooo........oooOO0OOooo........oooOO0OOooo........oooOO0OOooo...... //....oooOO0OOooo........oooOO0OOooo........oooOO0OOooo........oooOO0OOooo...... #ifndef MicroElecCapture_h #define MicroElecCapture_h 1 #include "G4VDiscreteProcess.hh" #include "G4MicroElecMaterialStructure.hh" #include "globals.hh" #include "G4ProductionCutsTable.hh" #include "G4ParticleChangeForGamma.hh" class G4Region; //....oooOO0OOooo........oooOO0OOooo........oooOO0OOooo........oooOO0OOooo...... class G4MicroElecCapture : public G4VDiscreteProcess { public: G4MicroElecCapture(const G4String& regName, G4double ekinlimit); virtual ~G4MicroElecCapture(); void SetKinEnergyLimit(G4double); void BuildPhysicsTable(const G4ParticleDefinition&) override; G4bool IsApplicable(const G4ParticleDefinition&) override; void Initialise(); G4VParticleChange* PostStepDoIt(const G4Track&, const G4Step&) override; G4MicroElecCapture(const G4MicroElecCapture&) = delete; G4MicroElecCapture& operator = (const G4MicroElecCapture &right) = delete; protected: G4double GetMeanFreePath(const G4Track&, G4double,G4ForceCondition*) override; private: G4double G_Lindhard_Rob(G4double , G4int , G4int , G4int , G4int ); typedef std::map > WorkFunctionTable; WorkFunctionTable tableWF; //Table of all materials simulated G4bool isInitialised; G4double kinEnergyThreshold; G4String regionName; G4Region* region; G4ParticleChangeForGamma fParticleChange; }; //....oooOO0OOooo........oooOO0OOooo........oooOO0OOooo........oooOO0OOooo...... #endif